sol-gel 经典综述3

JSol-GelSciTechnol(2011)57:236–244DOI10.1007/s10971-009-2127-7

ORIGINALPAPER

X-raystostudy,induce,andpatternstructuresinsol–gelmaterials

PaoloFalcaro PlinioInnocenzi

Received:5October2009/Accepted:1December2009/Publishedonline:30December2009ÓSpringerScience+BusinessMedia,LLC2009

AbstractX-raysinvestigationshavebeenshowntorevealimportantinformationregardingmaterialfeaturesandtheformationmechanismofmesostructuredmaterials.SmallangleX-rayscattering(SAXS)analysisperformedusingasynchrotronsourcehasbeenveryimportantintheoptimizationoftheorganizationofmesoporouscoatingsobtainedbyevaporationinducedself-assembly(EISA).TheinteractionbetweenX-raysandorderedmesoporous lmshasonlyrecentlybeenreported,andnewknowledgehasbeendevelopedtousethisexternalradiationsourcetotunethelocalmaterialproperties.HerewediscusstherecentdevelopmentsinX-raylithographycombinedwithsol–gelsynthesistopatternmesostructuredandhierarchi-calporouscoatingsincludingtheabilitytotailorfunc-tionalizedsurfaces.

KeywordsSol–gelÁX-rayÁSAXSÁDXRLÁ

LithographyÁSynchrotronÁPatterningÁMesoporousÁSurfacefunctionalisationÁMicroelectronicÁMicro uidicÁMicroarrayÁThin lms

1Introduction

Sincethediscoveryofmesoporousmaterials,X-rayshavebeenusedtocollectinformationabouttheorganizationof

P.Falcaro(&)

CSIRODivisionofMaterialsScienceandEngineering,PrivateBag33,ClaytonSouthSouthMDC,VIC3169,Australiae-mail:paolo.falcaro@csiro.au

P.Innocenzi

LaboratoriodiScienzadeiMaterialieNanotecnologie(LMNT),

`diSassariandCR-INSTM,PalazzoPouSalidD.A.P.,Universita

PiazzaDuomo6,07041Alghero,SS,Italy

micellesorpores.Thistoolhasbeenveryhelpfultoidentifyimportantvariablesaffectingtheselfassemblyprocess.Inthiswayithasbeenpossibletoadjustthesynthesisorthedepositionparameterstode neconditionstooptimizeacertainporesorganization[1].X-rayscat-teringrevealedalsohowtemperatureaffectsmesostructureandhowthethermaltreatmentinduceschangesinthespacegroup[2,3].Hillhousegroupwidelycharacterizedspatialgroupsonmesostructuredmaterials[4,5]evendevelopingasimulationcode[6–8]veryusefulformeso-phaseidenti cation.X-raydiffractionanalysishasbeenaveryimportantinvestigativetooltostudyevencomplexsystemssuchas:onepotsynthesisofmesoporous lmswithfunctionalmolecules[9],silicamesostructuredporesasnanoreactorsforsemiconductornanoparticlegrowth[10],fabricationofhierarchicallyporousthin lmsusingpolymernanospheres[11],self-assemblyofshapecon-trolledhierarchicallyporousthin lms[12],andmultiscaleporous lms[13].

X-raysarealsousedinlithographicprocesses;notonlycharacterizationcanbeperformedinthisrangeofwavelengthsbutalsopatterningtechnologycantakeadvantageofX-raysasasourcetoinducelocallycon-trolledchemicalandphysicalchangesinmaterials.Lithographyisanimportanttop-downprocessbecauseitoffersamethodbywhich ne-scalepatternsrequiredforfabricationandintegrationofcomponentdevicesareachieved[14].Increasingresolutionandmakingthepro-cesseasier,faster,cheaperormoreversatilearethecur-rentareasoffocustoimproveexistingmicro-andnanofabricationtechniques.HerewewanttohighlighttheconceptofversatilityofpatterningbyX-raysbecausethisversatilityoffersthematerialsdesignergreaterfreedominboththesynthesisandoptimizationofnewfunctionalmaterials.

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